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The Development of Chemically Amplified Positive- and Negat..:
Thackeray, James W.
;
Adams, Timothy
;
Cronin, Michael F.
...
Journal of Photopolymer Science and Technology. 7 (1994) 3 - p. 619-630 , 1994
Link:
https://doi.org/10.2494/photopolymer.7.619
RT Journal T1
The Development of Chemically Amplified Positive- and Negative-tone Resists for DUV Lithography
UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.7.619&Exemplar=1&LAN=DE A1 Thackeray, James W. A1 Adams, Timothy A1 Cronin, Michael F. A1 Denison, Mark A1 Fedynyshyn, Theodore H. A1 Georger, Jacque A1 Mori, J. Michael A1 Orsula, George W. A1 Sinta, Roger PB Technical Association of Photopolymers, Japan YR 1994 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 7 IS 3 SP 619 OP 630 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.7.619 DO https://doi.org/10.2494/photopolymer.7.619 SF ELIB - SuUB Bremen
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