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Novel ArF Excimer Laser Resists Based on Menthyl Methacryla..:
SHIDA, Naomi
;
USHIROGOUCHI, Tohru
;
ASAKAWA, Kohji
.
Journal of Photopolymer Science and Technology. 9 (1996) 3 - p. 457-464 , 1996
Link:
https://doi.org/10.2494/photopolymer.9.457
RT Journal T1 <Title>Novel ArF Excimer Laser Resists Based on Menthyl Methacrylate Terpolymer</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.9.457&Exemplar=1&LAN=DE A1 SHIDA, Naomi A1 USHIROGOUCHI, Tohru A1 ASAKAWA, Kohji A1 NAKASE, Makoto PB Technical Association of Photopolymers, Japan YR 1996 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 9 IS 3 SP 457 OP 464 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.9.457 DO https://doi.org/10.2494/photopolymer.9.457 SF ELIB - SuUB Bremen
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