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Progress in 193 nm Positive Resists:
ALLEN, R. D.
;
SOORIYAKUMARAN, R.
;
OPITZ, J.
...
Journal of Photopolymer Science and Technology. 9 (1996) 3 - p. 465-474 , 1996
Link:
https://doi.org/10.2494/photopolymer.9.465
RT Journal T1 <Title>Progress in 193 nm Positive Resists</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.9.465&Exemplar=1&LAN=DE A1 ALLEN, R. D. A1 SOORIYAKUMARAN, R. A1 OPITZ, J. A1 WALLRAFF, G. M. A1 BREYTA, G. A1 DIPIETRO, R. A. A1 HOFER, D. C. A1 KUNZ, R. R. A1 OKOROANYANWU, U. A1 WILLSON, C. G. PB Technical Association of Photopolymers, Japan YR 1996 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 9 IS 3 SP 465 OP 474 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.9.465 DO https://doi.org/10.2494/photopolymer.9.465 SF ELIB - SuUB Bremen
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