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High Performance Chemically Amplified Positive Electron-Bea..:
SAITO, SATOSHI
;
KIHARA, NAOKO
;
NAITO, TAKUYA
...
Journal of Photopolymer Science and Technology. 9 (1996) 4 - p. 677-684 , 1996
Link:
https://doi.org/10.2494/photopolymer.9.677
RT Journal T1 <Title>High Performance Chemically Amplified Positive Electron-Beam Resist: Optimization of Base Additives for Environmental Stabilization</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.2494_photopolymer.9.677&Exemplar=1&LAN=DE A1 SAITO, SATOSHI A1 KIHARA, NAOKO A1 NAITO, TAKUYA A1 NAKASE, MAKOTO A1 NAKASUGI, TETSURO A1 KATO, YOSHIMITSU PB Technical Association of Photopolymers, Japan YR 1996 SN 0914-9244 SN 1349-6336 JF Journal of Photopolymer Science and Technology VO 9 IS 4 SP 677 OP 684 LK http://dx.doi.org/https://doi.org/10.2494/photopolymer.9.677 DO https://doi.org/10.2494/photopolymer.9.677 SF ELIB - SuUB Bremen
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