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1 Ergebnisse
1
Simulation and Fabrication of HfO2 Thin Films Passivating S..:
Zhang, Xiao-Ying
;
Hsu, Chia-Hsun
;
Cho, Yun-Shao
...
Applied Sciences. 7 (2017) 12 - p. 1244 , 2017
Link:
https://doi.org/10.3390/app7121244
RT Journal T1
Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
UL https://suche.suub.uni-bremen.de/peid=cr-10.3390_app7121244&Exemplar=1&LAN=DE A1 Zhang, Xiao-Ying A1 Hsu, Chia-Hsun A1 Cho, Yun-Shao A1 Lien, Shui-Yang A1 Zhu, Wen-Zhang A1 Chen, Song-Yan A1 Huang, Wei A1 Xie, Lin-Gui A1 Chen, Lian-Dong A1 Zou, Xu-Yang A1 Huang, Si-Xin PB MDPI AG YR 2017 SN 2076-3417 JF Applied Sciences VO 7 IS 12 SP 1244 LK http://dx.doi.org/https://doi.org/10.3390/app7121244 DO https://doi.org/10.3390/app7121244 SF ELIB - SuUB Bremen
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