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1 Ergebnisse
1
Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosi..:
Cho, Haewon
;
Lee, Namgue
;
Choi, Hyeongsu
...
Applied Sciences. 9 (2019) 17 - p. 3531 , 2019
Link:
https://doi.org/10.3390/app9173531
RT Journal T1
Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
UL https://suche.suub.uni-bremen.de/peid=cr-10.3390_app9173531&Exemplar=1&LAN=DE A1 Cho, Haewon A1 Lee, Namgue A1 Choi, Hyeongsu A1 Park, Hyunwoo A1 Jung, Chanwon A1 Song, Seokhwi A1 Yuk, Hyunwoo A1 Kim, Youngjoon A1 Kim, Jong-Woo A1 Kim, Keunsik A1 Choi, Youngtae A1 Park, Suhyeon A1 Kwon, Yurim A1 Jeon, Hyeongtag PB MDPI AG YR 2019 SN 2076-3417 JF Applied Sciences VO 9 IS 17 SP 3531 LK http://dx.doi.org/https://doi.org/10.3390/app9173531 DO https://doi.org/10.3390/app9173531 SF ELIB - SuUB Bremen
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