I agree that this site is using cookies. You can find further informations
here
.
X
Login
Merkliste (
0
)
Home
About us
Home About us
Our history
Profile
Press & public relations
Friends
The library in figures
Exhibitions
Projects
Training, internships, careers
Films
Services & Information
Home Services & Information
Lending and interlibrary loans
Returns and renewals
Training and library tours
My Account
Library cards
New to the library?
Download Information
Opening hours
Learning spaces
PC, WLAN, copy, scan and print
Catalogs and collections
Home Catalogs and Collections
Rare books and manuscripts
Digital collections
Subject Areas
Our sites
Home Our sites
Central Library
Law Library (Juridicum)
BB Business and Economics (BB11)
BB Physics and Electrical Engineering
TB Engineering and Social Sciences
TB Economics and Nautical Sciences
TB Music
TB Art & Design
TB Bremerhaven
Contact the library
Home Contact the library
Staff Directory
Open access & publishing
Home Open access & publishing
Reference management: Citavi & RefWorks
Publishing documents
Open Access in Bremen
zur Desktop-Version
Toggle navigation
Merkliste
1 Ergebnisse
1
The Study of Reactive Ion Etching of Heavily Doped Polysili..:
Zhou, Na
;
Li, Junjie
;
Mao, Haiyang
...
Materials. 13 (2020) 19 - p. 4278 , 2020
Link:
https://doi.org/10.3390/ma13194278
RT Journal T1
The Study of Reactive Ion Etching of Heavily Doped Polysilicon Based on HBr/O2/He Plasmas for Thermopile Devices
UL https://suche.suub.uni-bremen.de/peid=cr-10.3390_ma13194278&Exemplar=1&LAN=DE A1 Zhou, Na A1 Li, Junjie A1 Mao, Haiyang A1 Liu, Hao A1 Liu, Jinbiao A1 Gao, Jianfeng A1 Xiang, Jinjuan A1 Hu, Yanpeng A1 Shi, Meng A1 Ju, Jiaxin A1 Lei, Yuxiao A1 Yang, Tao A1 Li, Junfeng A1 Wang, Wenwu PB MDPI AG YR 2020 SN 1996-1944 JF Materials VO 13 IS 19 SP 4278 LK http://dx.doi.org/https://doi.org/10.3390/ma13194278 DO https://doi.org/10.3390/ma13194278 SF ELIB - SuUB Bremen
Export
RefWorks (nur Desktop-Version!)
Flow
(Zuerst in
Flow
einloggen, dann importieren)