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1 Ergebnisse
1
Radiation Tolerance and Charge Trapping Enhancement of ALD ..:
Spassov, Dencho
;
Paskaleva, Albena
;
Guziewicz, Elżbieta
...
Materials. 14 (2021) 4 - p. 849 , 2021
Link:
https://doi.org/10.3390/ma14040849
RT Journal T1
Radiation Tolerance and Charge Trapping Enhancement of ALD HfO2/Al2O3 Nanolaminated Dielectrics
UL https://suche.suub.uni-bremen.de/peid=cr-10.3390_ma14040849&Exemplar=1&LAN=DE A1 Spassov, Dencho A1 Paskaleva, Albena A1 Guziewicz, Elżbieta A1 Davidović, Vojkan A1 Stanković, Srboljub A1 Djorić-Veljković, Snežana A1 Ivanov, Tzvetan A1 Stanchev, Todor A1 Stojadinović, Ninoslav PB MDPI AG YR 2021 SN 1996-1944 JF Materials VO 14 IS 4 SP 849 LK http://dx.doi.org/https://doi.org/10.3390/ma14040849 DO https://doi.org/10.3390/ma14040849 SF ELIB - SuUB Bremen
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