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1 Ergebnisse
1
Area-Selective Atomic Layer Deposition of ZnO on Si\SiO2 Mo..:
Moeini, Behnam
;
Avval, Tahereh G.
;
Brongersma, Hidde H.
...
Materials. 16 (2023) 13 - p. 4688 , 2023
Link:
https://doi.org/10.3390/ma16134688
RT Journal T1
Area-Selective Atomic Layer Deposition of ZnO on Si\SiO2 Modified with Tris(dimethylamino)methylsilane
UL https://suche.suub.uni-bremen.de/peid=cr-10.3390_ma16134688&Exemplar=1&LAN=DE A1 Moeini, Behnam A1 Avval, Tahereh G. A1 Brongersma, Hidde H. A1 Průša, Stanislav A1 Bábík, Pavel A1 Vaníčková, Elena A1 Strohmeier, Brian R. A1 Bell, David S. A1 Eggett, Dennis A1 George, Steven M. A1 Linford, Matthew R. PB MDPI AG YR 2023 SN 1996-1944 JF Materials VO 16 IS 13 SP 4688 LK http://dx.doi.org/https://doi.org/10.3390/ma16134688 DO https://doi.org/10.3390/ma16134688 SF ELIB - SuUB Bremen
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