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1 Ergebnisse
1
Deposition and Characterization of RP-ALD SiO2 Thin Films w..:
Zhang, Xiao-Ying
;
Yang, Yue
;
Zhang, Zhi-Xuan
...
Nanomaterials. 11 (2021) 5 - p. 1173 , 2021
Link:
https://doi.org/10.3390/nano11051173
RT Journal T1
Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
UL https://suche.suub.uni-bremen.de/peid=cr-10.3390_nano11051173&Exemplar=1&LAN=DE A1 Zhang, Xiao-Ying A1 Yang, Yue A1 Zhang, Zhi-Xuan A1 Geng, Xin-Peng A1 Hsu, Chia-Hsun A1 Wu, Wan-Yu A1 Lien, Shui-Yang A1 Zhu, Wen-Zhang PB MDPI AG YR 2021 SN 2079-4991 JF Nanomaterials VO 11 IS 5 SP 1173 LK http://dx.doi.org/https://doi.org/10.3390/nano11051173 DO https://doi.org/10.3390/nano11051173 SF ELIB - SuUB Bremen
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