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1 Ergebnisse
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Influence of Additive N2 on O2 Plasma Ashing Process in Ind..:
You, Ye-Bin
;
Lee, Young-Seok
;
Kim, Si-Jun
...
Nanomaterials. 12 (2022) 21 - p. 3798 , 2022
Link:
https://doi.org/10.3390/nano12213798
RT Journal T1
Influence of Additive N2 on O2 Plasma Ashing Process in Inductively Coupled Plasma
UL https://suche.suub.uni-bremen.de/peid=cr-10.3390_nano12213798&Exemplar=1&LAN=DE A1 You, Ye-Bin A1 Lee, Young-Seok A1 Kim, Si-Jun A1 Cho, Chul-Hee A1 Seong, In-Ho A1 Jeong, Won-Nyoung A1 Choi, Min-Su A1 You, Shin-Jae PB MDPI AG YR 2022 SN 2079-4991 JF Nanomaterials VO 12 IS 21 SP 3798 LK http://dx.doi.org/https://doi.org/10.3390/nano12213798 DO https://doi.org/10.3390/nano12213798 SF ELIB - SuUB Bremen
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