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1 Ergebnisse
1
Enhancing Si3N4 Selectivity over SiO2 in Low-RF Power NF3–O..:
Tung, Nguyen Hoang
;
Lee, Heesoo
;
Dinh, Duy Khoe
...
Sensors. 24 (2024) 10 - p. 3089 , 2024
Link:
https://doi.org/10.3390/s24103089
RT Journal T1
Enhancing Si3N4 Selectivity over SiO2 in Low-RF Power NF3–O2 Reactive Ion Etching: The Effect of NO Surface Reaction
UL https://suche.suub.uni-bremen.de/peid=cr-10.3390_s24103089&Exemplar=1&LAN=DE A1 Tung, Nguyen Hoang A1 Lee, Heesoo A1 Dinh, Duy Khoe A1 Kim, Dae-Woong A1 Lee, Jin Young A1 Eom, Geon Woong A1 Kim, Hyeong-U A1 Kang, Woo Seok PB MDPI AG YR 2024 SN 1424-8220 JF Sensors VO 24 IS 10 SP 3089 LK http://dx.doi.org/https://doi.org/10.3390/s24103089 DO https://doi.org/10.3390/s24103089 SF ELIB - SuUB Bremen
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