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1 Ergebnisse
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Diffusion mechanism of fluorine in plasma processing of III..:
Kodama, Y.
;
Zaizen, Y.
;
Minari, H.
...
Japanese Journal of Applied Physics. 59 (2020) SJ - p. SJJB01 , 2020
Link:
https://doi.org/10.35848/1347-4065/ab82aa
RT Journal T1 <Title>Diffusion mechanism of fluorine in plasma processing of III–V semiconductor compounds</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.35848_1347-4065_ab82aa&Exemplar=1&LAN=DE A1 Kodama, Y. A1 Zaizen, Y. A1 Minari, H. A1 Cho, Y. A1 Fukasawa, M. A1 Kugimiya, K. A1 Nagaoka, K. A1 Iwamoto, H. PB IOP Publishing YR 2020 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 59 IS SJ SP SJJB01 LK http://dx.doi.org/https://doi.org/10.35848/1347-4065/ab82aa DO https://doi.org/10.35848/1347-4065/ab82aa SF ELIB - SuUB Bremen
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