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1 Ergebnisse
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HfN multi charge trapping layers for Hf-based metal-oxide-n..:
Ohmi, S.
;
Horiuchi, Y.
;
Morita, H.
..
Japanese Journal of Applied Physics. 60 (2021) SB - p. SBBB03 , 2021
Link:
https://doi.org/10.35848/1347-4065/abe09f
RT Journal T1 <Title>HfN multi charge trapping layers for Hf-based metal-oxide-nitride-oxide-Si nonvolatile memory</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.35848_1347-4065_abe09f&Exemplar=1&LAN=DE A1 Ohmi, S. A1 Horiuchi, Y. A1 Morita, H. A1 Ihara, A. A1 Pyo, J.Y. PB IOP Publishing YR 2021 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 60 IS SB SP SBBB03 LK http://dx.doi.org/https://doi.org/10.35848/1347-4065/abe09f DO https://doi.org/10.35848/1347-4065/abe09f SF ELIB - SuUB Bremen
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