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1 Ergebnisse
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Reactive ion etching process of SiO2 film using on-site syn..:
Iino, Daiki
;
Tanida, Satoshi
;
Kurihara, Kazuaki
...
Japanese Journal of Applied Physics. 60 (2021) 5 - p. 050904 , 2021
Link:
https://doi.org/10.35848/1347-4065/abf9e3
RT Journal T1
Reactive ion etching process of SiO2 film using on-site synthesized C2F4 from CF4
UL https://suche.suub.uni-bremen.de/peid=cr-10.35848_1347-4065_abf9e3&Exemplar=1&LAN=DE A1 Iino, Daiki A1 Tanida, Satoshi A1 Kurihara, Kazuaki A1 Fukumizu, Hiroyuki A1 Sakai, Itsuko A1 Abe, Junko A1 Fukuhara, Jota A1 Tanaka, Rei A1 Tanaka, Tomoyuki A1 Kikura, Jou A1 Kakiuchi, Hiroaki A1 Yasutake, Kiyoshi A1 Ohmi, Hiromasa A1 Hayashi, Hisataka PB IOP Publishing YR 2021 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 60 IS 5 SP 050904 LK http://dx.doi.org/https://doi.org/10.35848/1347-4065/abf9e3 DO https://doi.org/10.35848/1347-4065/abf9e3 SF ELIB - SuUB Bremen
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