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Morphological control of nanostructured Ge films in high Ar..:
Hayashi, Junki
;
Nagai, Kenta
;
Habu, Yuma
...
Japanese Journal of Applied Physics. 61 (2021) SA - p. SA1002 , 2021
Link:
https://doi.org/10.35848/1347-4065/ac2b7b
RT Journal T1
Morphological control of nanostructured Ge films in high Ar-gas-pressure plasma sputtering process for Li ion batteries
UL https://suche.suub.uni-bremen.de/peid=cr-10.35848_1347-4065_ac2b7b&Exemplar=1&LAN=DE A1 Hayashi, Junki A1 Nagai, Kenta A1 Habu, Yuma A1 Ikebe, Yumiko A1 Hiramatsu, Mineo A1 Narishige, Ryota A1 Itagaki, Naho A1 Shiratani, Masaharu A1 Setsuhara, Yuichi A1 Uchida, Giichiro PB IOP Publishing YR 2021 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 61 IS SA SP SA1002 LK http://dx.doi.org/https://doi.org/10.35848/1347-4065/ac2b7b DO https://doi.org/10.35848/1347-4065/ac2b7b SF ELIB - SuUB Bremen
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