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1 Ergebnisse
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Introduction of high tensile strain into Ge-on-Insulator st..:
Han, Xueyang
;
Chen, Chia-Tsong
;
Lim, Cheol-Min
...
Japanese Journal of Applied Physics. 61 (2022) SC - p. SC1027 , 2022
Link:
https://doi.org/10.35848/1347-4065/ac4075
RT Journal T1
Introduction of high tensile strain into Ge-on-Insulator structures by oxidation and annealing at high temperature
UL https://suche.suub.uni-bremen.de/peid=cr-10.35848_1347-4065_ac4075&Exemplar=1&LAN=DE A1 Han, Xueyang A1 Chen, Chia-Tsong A1 Lim, Cheol-Min A1 Toprasertpong, Kasidit A1 Takenaka, Mitsuru A1 Takagi, Shinichi PB IOP Publishing YR 2022 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 61 IS SC SP SC1027 LK http://dx.doi.org/https://doi.org/10.35848/1347-4065/ac4075 DO https://doi.org/10.35848/1347-4065/ac4075 SF ELIB - SuUB Bremen
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