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1 Ergebnisse
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Applying stochastic simulation to study defect formation in..:
Melvin III, Lawrence S.
;
Welling, Ulrich
;
Kandel, Yudhishthir
...
Japanese Journal of Applied Physics. 61 (2022) SD - p. SD1030 , 2022
Link:
https://doi.org/10.35848/1347-4065/ac5b22
RT Journal T1
Applying stochastic simulation to study defect formation in EUV photoresists
UL https://suche.suub.uni-bremen.de/peid=cr-10.35848_1347-4065_ac5b22&Exemplar=1&LAN=DE A1 Melvin III, Lawrence S. A1 Welling, Ulrich A1 Kandel, Yudhishthir A1 Levinson, Zachary A. A1 Taoka, Hironobu A1 Stock, Hans-Jurgen A1 Demmerle, Wolfgang PB IOP Publishing YR 2022 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 61 IS SD SP SD1030 LK http://dx.doi.org/https://doi.org/10.35848/1347-4065/ac5b22 DO https://doi.org/10.35848/1347-4065/ac5b22 SF ELIB - SuUB Bremen
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