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Self-aligned patterning on β-Ga2O3 substrates via backside-..:
Oshima, Takayoshi
Japanese Journal of Applied Physics. 62 (2023) 1 - p. 018004 , 2023
Link:
https://doi.org/10.35848/1347-4065/acb0b3
RT Journal T1 <Title>Self-aligned patterning on β-Ga2O3 substrates via backside-exposure photolithography</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.35848_1347-4065_acb0b3&Exemplar=1&LAN=DE A1 Oshima, Takayoshi PB IOP Publishing YR 2023 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 62 IS 1 SP 018004 LK http://dx.doi.org/https://doi.org/10.35848/1347-4065/acb0b3 DO https://doi.org/10.35848/1347-4065/acb0b3 SF ELIB - SuUB Bremen
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