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e-beam metrology of thin resist for high NA EUVL:
Lorusso, Gian Francesco
;
De Simone, Danilo
;
Zidan, Mohamed
...
Japanese Journal of Applied Physics. 62 (2023) SG - p. SG0808 , 2023
Link:
https://doi.org/10.35848/1347-4065/acc3a4
RT Journal T1
e-beam metrology of thin resist for high NA EUVL
UL https://suche.suub.uni-bremen.de/peid=cr-10.35848_1347-4065_acc3a4&Exemplar=1&LAN=DE A1 Lorusso, Gian Francesco A1 De Simone, Danilo A1 Zidan, Mohamed A1 Severi, Joren A1 Moussa, Alain A1 Dey, Bappaditya A1 Halder, Sandip A1 Goldenshtein, Alex A1 Houchens, Kevin A1 Santoro, Gaetano A1 Fischer, Daniel A1 Muellender, Angelika A1 Mack, Chris A1 Kondo, Tsuyoshi A1 Shohjoh, Tomoyasu A1 Ikota, Masami A1 Charley, Anne-Laure A1 De Gendt, Stefan A1 Leray, Philippe PB IOP Publishing YR 2023 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 62 IS SG SP SG0808 LK http://dx.doi.org/https://doi.org/10.35848/1347-4065/acc3a4 DO https://doi.org/10.35848/1347-4065/acc3a4 SF ELIB - SuUB Bremen
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