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1 Ergebnisse
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Development of electron beam lithography technique for larg..:
Youn, Sung-Won
;
Suzuki, Kenta
;
Hiroshima, Hiroshi
..
Japanese Journal of Applied Physics. 63 (2024) 3 - p. 03SP06 , 2024
Link:
https://doi.org/10.35848/1347-4065/ad1fb2
RT Journal T1
Development of electron beam lithography technique for large area nano structural color
UL https://suche.suub.uni-bremen.de/peid=cr-10.35848_1347-4065_ad1fb2&Exemplar=1&LAN=DE A1 Youn, Sung-Won A1 Suzuki, Kenta A1 Hiroshima, Hiroshi A1 Toda, Shunichi A1 Nagai, Satoshi PB IOP Publishing YR 2024 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 63 IS 3 SP 03SP06 LK http://dx.doi.org/https://doi.org/10.35848/1347-4065/ad1fb2 DO https://doi.org/10.35848/1347-4065/ad1fb2 SF ELIB - SuUB Bremen
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