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Point-defect management in homoepitaxially grown Si-doped G..:
Rathkanthiwar, Shashwat
;
Bagheri, Pegah
;
Khachariya, Dolar
...
Applied Physics Express. 15 (2022) 5 - p. 051003 , 2022
Link:
https://doi.org/10.35848/1882-0786/ac6566
RT Journal T1
Point-defect management in homoepitaxially grown Si-doped GaN by MOCVD for vertical power devices
UL https://suche.suub.uni-bremen.de/peid=cr-10.35848_1882-0786_ac6566&Exemplar=1&LAN=DE A1 Rathkanthiwar, Shashwat A1 Bagheri, Pegah A1 Khachariya, Dolar A1 Mita, Seiji A1 Pavlidis, Spyridon A1 Reddy, Pramod A1 Kirste, Ronny A1 Tweedie, James A1 Sitar, Zlatko A1 Collazo, Ramón PB IOP Publishing YR 2022 SN 1882-0778 SN 1882-0786 JF Applied Physics Express VO 15 IS 5 SP 051003 LK http://dx.doi.org/https://doi.org/10.35848/1882-0786/ac6566 DO https://doi.org/10.35848/1882-0786/ac6566 SF ELIB - SuUB Bremen
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