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Intercalation of Si between MoS2 layers:
van Bremen, Rik
;
Yao, Qirong
;
Banerjee, Soumya
...
Beilstein Journal of Nanotechnology. 8 (2017) - p. 1952-1960 , 2017
Link:
https://doi.org/10.3762/bjnano.8.196
RT Journal T1 <Title>Intercalation of Si between MoS2 layers</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.3762_bjnano.8.196&Exemplar=1&LAN=DE A1 van Bremen, Rik A1 Yao, Qirong A1 Banerjee, Soumya A1 Cakir, Deniz A1 Oncel, Nuri A1 Zandvliet, Harold J W PB Beilstein Institut YR 2017 SN 2190-4286 JF Beilstein Journal of Nanotechnology VO 8 SP 1952 OP 1960 LK http://dx.doi.org/https://doi.org/10.3762/bjnano.8.196 DO https://doi.org/10.3762/bjnano.8.196 SF ELIB - SuUB Bremen
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