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1 Ergebnisse
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Characteristics of a nickel thin film and formation of nick..:
Kim, Jinho
;
Jang, Woochool
;
Park, Jingyu
...
Journal of the Korean Physical Society. 66 (2015) 5 - p. 821-827 , 2015
Link:
https://doi.org/10.3938/jkps.66.821
RT Journal T1 <Title>Characteristics of a nickel thin film and formation of nickel silicide by using remote plasma atomic layer deposition with Ni( i Pr-DAD)2</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.3938_jkps.66.821&Exemplar=1&LAN=DE A1 Kim, Jinho A1 Jang, Woochool A1 Park, Jingyu A1 Jeon, Heeyoung A1 Kim, Hyunjung A1 Yuh, Junhan A1 Jeon, Hyeongtag PB Korean Physical Society YR 2015 SN 0374-4884 SN 1976-8524 JF Journal of the Korean Physical Society VO 66 IS 5 SP 821 OP 827 LK http://dx.doi.org/https://doi.org/10.3938/jkps.66.821 DO https://doi.org/10.3938/jkps.66.821 SF ELIB - SuUB Bremen
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