I agree that this site is using cookies. You can find further informations
here
.
X
Login
Merkliste (
0
)
Home
About us
Home About us
Our history
Profile
Press & public relations
Friends
The library in figures
Exhibitions
Projects
Training, internships, careers
Films
Services & Information
Home Services & Information
Lending and interlibrary loans
Returns and renewals
Training and library tours
My Account
Library cards
New to the library?
Download Information
Opening hours
Learning spaces
PC, WLAN, copy, scan and print
Catalogs and collections
Home Catalogs and Collections
Rare books and manuscripts
Digital collections
Subject Areas
Our sites
Home Our sites
Central Library
Law Library (Juridicum)
BB Business and Economics (BB11)
BB Physics and Electrical Engineering
TB Engineering and Social Sciences
TB Economics and Nautical Sciences
TB Music
TB Art & Design
TB Bremerhaven
Contact the library
Home Contact the library
Staff Directory
Open access & publishing
Home Open access & publishing
Reference management: Citavi & RefWorks
Publishing documents
Open Access in Bremen
zur Desktop-Version
Toggle navigation
Merkliste
1 Ergebnisse
1
Erratum: Effects of plasma-enhanced chemical vapor depositi..:
Cho, Kuk-Hyun
;
Cho, Young Joon
;
Chang, Hyo Sik
..
Journal of the Korean Physical Society. 67 (2015) 9 - p. 1708-1708 , 2015
Link:
https://doi.org/10.3938/jkps.67.1708
RT Journal T1 <Title>Erratum: Effects of plasma-enhanced chemical vapor deposition (PECVD) on the carrier lifetime of Al2O3 passivation stack</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.3938_jkps.67.1708&Exemplar=1&LAN=DE A1 Cho, Kuk-Hyun A1 Cho, Young Joon A1 Chang, Hyo Sik A1 Kim, Kyung-Joong A1 Song, Hee Eun PB Korean Physical Society YR 2015 SN 0374-4884 SN 1976-8524 JF Journal of the Korean Physical Society VO 67 IS 9 SP 1708 OP 1708 LK http://dx.doi.org/https://doi.org/10.3938/jkps.67.1708 DO https://doi.org/10.3938/jkps.67.1708 SF ELIB - SuUB Bremen
Export
RefWorks (nur Desktop-Version!)
Flow
(Zuerst in
Flow
einloggen, dann importieren)
