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1 Ergebnisse
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Effects of plasma-enhanced chemical vapor deposition (PECVD..:
Cho, Kuk-Hyun
;
Cho, Young Joon
;
Chang, Hyo Sik
..
Journal of the Korean Physical Society. 67 (2015) 6 - p. 995-1000 , 2015
Link:
https://doi.org/10.3938/jkps.67.995
RT Journal T1 <Title>Effects of plasma-enhanced chemical vapor deposition (PECVD) on the carrier lifetime of Al2O3 passivation stack</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.3938_jkps.67.995&Exemplar=1&LAN=DE A1 Cho, Kuk-Hyun A1 Cho, Young Joon A1 Chang, Hyo Sik A1 Kim, Kyung-Joong A1 Song, Hee Eun PB Korean Physical Society YR 2015 SN 0374-4884 SN 1976-8524 JF Journal of the Korean Physical Society VO 67 IS 6 SP 995 OP 1000 LK http://dx.doi.org/https://doi.org/10.3938/jkps.67.995 DO https://doi.org/10.3938/jkps.67.995 SF ELIB - SuUB Bremen
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