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1 Ergebnisse
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Plasma Etching of Silicon at a High Flow and a High Pressur..:
Kwon, Hee-Tae
;
Kim, Woo-Jae
;
Shin, Gi-Won
...
Journal of the Korean Physical Society. 74 (2019) 12 - p. 1135-1139 , 2019
Link:
https://doi.org/10.3938/jkps.74.1135
RT Journal T1 <Title>Plasma Etching of Silicon at a High Flow and a High Pressure of NF3 in Reactive Ion Etching</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.3938_jkps.74.1135&Exemplar=1&LAN=DE A1 Kwon, Hee-Tae A1 Kim, Woo-Jae A1 Shin, Gi-Won A1 Lee, Hwan-Hee A1 Lee, Tae-Hyun A1 Kang, Min-Ho A1 Kwon, Gi-Chung PB Korean Physical Society YR 2019 SN 0374-4884 SN 1976-8524 JF Journal of the Korean Physical Society VO 74 IS 12 SP 1135 OP 1139 LK http://dx.doi.org/https://doi.org/10.3938/jkps.74.1135 DO https://doi.org/10.3938/jkps.74.1135 SF ELIB - SuUB Bremen
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