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1 Ergebnisse
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First Wafer Effect of Multiple SiO2/SiN Stack Layers Prepar..:
Kim, Min Su
;
Kwon, Hojoong
;
Kim, Hyoyoung
...
Journal of the Korean Physical Society. 76 (2020) 10 - p. 911-915 , 2020
Link:
https://doi.org/10.3938/jkps.76.911
RT Journal T1 <Title>First Wafer Effect of Multiple SiO2/SiN Stack Layers Prepared by using Plasma-enhanced Chemical Vapor Deposition</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.3938_jkps.76.911&Exemplar=1&LAN=DE A1 Kim, Min Su A1 Kwon, Hojoong A1 Kim, Hyoyoung A1 Park, Seung-ho A1 Lee, Jeong Woo A1 Na, Kyung Pil A1 Kong, Chul Min A1 Kim, Yong Gab PB Korean Physical Society YR 2020 SN 0374-4884 SN 1976-8524 JF Journal of the Korean Physical Society VO 76 IS 10 SP 911 OP 915 LK http://dx.doi.org/https://doi.org/10.3938/jkps.76.911 DO https://doi.org/10.3938/jkps.76.911 SF ELIB - SuUB Bremen
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