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1 Ergebnisse
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Ge Addition during 4H-SiC Epitaxial Growth by CVD: Mechanis..:
Soulière, Véronique
;
Alassaad, Kassem
;
Cauwet, François
...
Materials Science Forum. 821-823 (2015) - p. 115-120 , 2015
Link:
https://doi.org/10.4028/www.scientific.net/msf.821-823..
RT Journal T1
Ge Addition during 4H-SiC Epitaxial Growth by CVD: Mechanism of Incorporation
UL https://suche.suub.uni-bremen.de/peid=cr-10.4028_www.scientific.net_msf.821-823.115&Exemplar=1&LAN=DE A1 Soulière, Véronique A1 Alassaad, Kassem A1 Cauwet, François A1 Peyre, Hervé A1 Kups, Thomas A1 Pezoldt, J. A1 Kwasnicki, Pawel A1 Ferro, Gabriel PB Trans Tech Publications, Ltd. YR 2015 SN 1662-9752 JF Materials Science Forum VO 821-823 SP 115 OP 120 LK http://dx.doi.org/https://doi.org/10.4028/www.scientific.net/msf.821-823.115 DO https://doi.org/10.4028/www.scientific.net/msf.821-823.115 SF ELIB - SuUB Bremen
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