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1 Ergebnisse
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Characterization of SiO2 Over Poly-Si Mask Etching in Ar/C4..:
Seong, In Ho
;
Lee, Jang Jae
;
Cho, Chul Hee
...
Applied Science and Convergence Technology. 30 (2021) 6 - p. 176-182 , 2021
Link:
https://doi.org/10.5757/asct.2021.30.6.176
RT Journal T1 <Title>Characterization of SiO2 Over Poly-Si Mask Etching in Ar/C4F8 Capacitively Coupled Plasma</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.5757_asct.2021.30.6.176&Exemplar=1&LAN=DE A1 Seong, In Ho A1 Lee, Jang Jae A1 Cho, Chul Hee A1 Lee, Yeong Seok A1 Kim, Si Jun A1 You, Shin Jae PB The Korean Vacuum Society YR 2021 SN 2288-6559 JF Applied Science and Convergence Technology VO 30 IS 6 SP 176 OP 182 LK http://dx.doi.org/https://doi.org/10.5757/asct.2021.30.6.176 DO https://doi.org/10.5757/asct.2021.30.6.176 SF ELIB - SuUB Bremen
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