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1 Ergebnisse
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Comparison of Multilayer Dielectric Thin Films for Future M..:
Park, Sang-Uk
;
Kwon, Hyuk-Min
;
Han, In-Shik
...
Japanese Journal of Applied Physics. 50 (2011) 10S - p. 10PB06 , 2011
Link:
https://doi.org/10.7567/jjap.50.10pb06
RT Journal T1
Comparison of Multilayer Dielectric Thin Films for Future Metal–Insulator–Metal Capacitors: Al2O3/HfO2/Al2O3versus SiO2/HfO2/SiO2
UL https://suche.suub.uni-bremen.de/peid=cr-10.7567_jjap.50.10pb06&Exemplar=1&LAN=DE A1 Park, Sang-Uk A1 Kwon, Hyuk-Min A1 Han, In-Shik A1 Jung, Yi-Jung A1 Kwak, Ho-Young A1 Choi, Woon-Il A1 Ha, Man-Lyun A1 Lee, Ju-Il A1 Kang, Chang-Yong A1 Lee, Byoung-Hun A1 Jammy, Raj A1 Lee, Hi-Deok PB IOP Publishing YR 2011 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 50 IS 10S SP 10PB06 LK http://dx.doi.org/https://doi.org/10.7567/jjap.50.10pb06 DO https://doi.org/10.7567/jjap.50.10pb06 SF ELIB - SuUB Bremen
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