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1 Ergebnisse
1
Nanoimprint Lithography of 20-nm-Pitch Dot Array Pattern Us..:
Ootera, Yasuaki
;
Sugawara, Katsuya
;
Kanamaru, Masahiro
...
Japanese Journal of Applied Physics. 52 (2013) 10R - p. 105201 , 2013
Link:
https://doi.org/10.7567/jjap.52.105201
RT Journal T1
Nanoimprint Lithography of 20-nm-Pitch Dot Array Pattern Using Tone Reversal Process
UL https://suche.suub.uni-bremen.de/peid=cr-10.7567_jjap.52.105201&Exemplar=1&LAN=DE A1 Ootera, Yasuaki A1 Sugawara, Katsuya A1 Kanamaru, Masahiro A1 Yamamoto, Ryousuke A1 Kawamonzen, Yoshiaki A1 Kihara, Naoko A1 Kamata, Yoshiyuki A1 Kikitsu, Akira PB IOP Publishing YR 2013 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 52 IS 10R SP 105201 LK http://dx.doi.org/https://doi.org/10.7567/jjap.52.105201 DO https://doi.org/10.7567/jjap.52.105201 SF ELIB - SuUB Bremen
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