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1 Ergebnisse
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Investigation of trap properties of Hf0.83Zr0.17O2high-kgat..:
Tsai, Shih-Chang
;
Wu, San-Lein
;
Huang, Po-Chin
...
Japanese Journal of Applied Physics. 53 (2014) 8S1 - p. 08LB03 , 2014
Link:
https://doi.org/10.7567/jjap.53.08lb03
RT Journal T1
Investigation of trap properties of Hf0.83Zr0.17O2high-kgate stack p-type MOSFETs by low-frequency (1/f) noise and random telegraph noise analyses
UL https://suche.suub.uni-bremen.de/peid=cr-10.7567_jjap.53.08lb03&Exemplar=1&LAN=DE A1 Tsai, Shih-Chang A1 Wu, San-Lein A1 Huang, Po-Chin A1 Wang, Bo-Chin A1 Tsai, Kai-Shiang A1 Kao, Tsung-Hsien A1 Yang, Chih-Wei A1 Chen, Cheng-Guo A1 Cheng, Osbert A1 Fang, Yean-Kuen A1 Chang, Shoou-Jinn A1 Chen, Jone-Fang PB IOP Publishing YR 2014 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 53 IS 8S1 SP 08LB03 LK http://dx.doi.org/https://doi.org/10.7567/jjap.53.08lb03 DO https://doi.org/10.7567/jjap.53.08lb03 SF ELIB - SuUB Bremen
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