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1 Ergebnisse
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Novel Ni silicide formed with a Ni/Er/Ni/TiN structure for ..:
Oh, Sung-Kwen
;
Shin, Hong-Sik
;
Li, Meng
...
Japanese Journal of Applied Physics. 53 (2014) 8S3 - p. 08NE05 , 2014
Link:
https://doi.org/10.7567/jjap.53.08ne05
RT Journal T1 <Title>Novel Ni silicide formed with a Ni/Er/Ni/TiN structure for thermal stable and low contact resistance source/drain in MOSFETs</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.7567_jjap.53.08ne05&Exemplar=1&LAN=DE A1 Oh, Sung-Kwen A1 Shin, Hong-Sik A1 Li, Meng A1 Lee, Horyeong A1 Lee, Ga-Won A1 Lee, Hi-Deok PB IOP Publishing YR 2014 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 53 IS 8S3 SP 08NE05 LK http://dx.doi.org/https://doi.org/10.7567/jjap.53.08ne05 DO https://doi.org/10.7567/jjap.53.08ne05 SF ELIB - SuUB Bremen
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