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1 Ergebnisse
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Etching characteristics and mechanisms of Mo thin films in ..:
Lim, Nomin
;
Efremov, Alexander
;
Yeom, Geun Young
..
Japanese Journal of Applied Physics. 53 (2014) 11 - p. 116201 , 2014
Link:
https://doi.org/10.7567/jjap.53.116201
RT Journal T1
Etching characteristics and mechanisms of Mo thin films in Cl2/Ar and CF4/Ar inductively coupled plasmas
UL https://suche.suub.uni-bremen.de/peid=cr-10.7567_jjap.53.116201&Exemplar=1&LAN=DE A1 Lim, Nomin A1 Efremov, Alexander A1 Yeom, Geun Young A1 Choi, Bok-Gil A1 Kwon, Kwang-Ho PB IOP Publishing YR 2014 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 53 IS 11 SP 116201 LK http://dx.doi.org/https://doi.org/10.7567/jjap.53.116201 DO https://doi.org/10.7567/jjap.53.116201 SF ELIB - SuUB Bremen
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