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1 Ergebnisse
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Characterization of the charge trapping properties in p-cha..:
Chiu, Yung-Yueh
;
Yang, Bo-Jun
;
Li, Fu-Hai
...
Japanese Journal of Applied Physics. 54 (2015) 10 - p. 104201 , 2015
Link:
https://doi.org/10.7567/jjap.54.104201
RT Journal T1
Characterization of the charge trapping properties in p-channel silicon–oxide–nitride–oxide–silicon memory devices including SiO2/Si3N4 interfacial transition layer
UL https://suche.suub.uni-bremen.de/peid=cr-10.7567_jjap.54.104201&Exemplar=1&LAN=DE A1 Chiu, Yung-Yueh A1 Yang, Bo-Jun A1 Li, Fu-Hai A1 Chang, Ru-Wei A1 Sun, Wein-Town A1 Lo, Chun-Yuan A1 Hsu, Chia-Jung A1 Kuo, Chao-Wei A1 Shirota, Riichiro PB IOP Publishing YR 2015 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 54 IS 10 SP 104201 LK http://dx.doi.org/https://doi.org/10.7567/jjap.54.104201 DO https://doi.org/10.7567/jjap.54.104201 SF ELIB - SuUB Bremen
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