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Properties of single-layer MoS2 film fabricated by combinat..:
Ishihara, Seiya
;
Hibino, Yusuke
;
Sawamoto, Naomi
...
Japanese Journal of Applied Physics. 55 (2016) 6S1 - p. 06GF01 , 2016
Link:
https://doi.org/10.7567/jjap.55.06gf01
RT Journal T1
Properties of single-layer MoS2 film fabricated by combination of sputtering deposition and post deposition sulfurization annealing using (t-C4H9)2S2
UL https://suche.suub.uni-bremen.de/peid=cr-10.7567_jjap.55.06gf01&Exemplar=1&LAN=DE A1 Ishihara, Seiya A1 Hibino, Yusuke A1 Sawamoto, Naomi A1 Suda, Kohei A1 Ohashi, Takumi A1 Matsuura, Kentarou A1 Machida, Hideaki A1 Ishikawa, Masato A1 Sudoh, Hiroshi A1 Wakabayashi, Hitoshi A1 Ogura, Atsushi PB IOP Publishing YR 2016 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 55 IS 6S1 SP 06GF01 LK http://dx.doi.org/https://doi.org/10.7567/jjap.55.06gf01 DO https://doi.org/10.7567/jjap.55.06gf01 SF ELIB - SuUB Bremen
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