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1 Ergebnisse
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Molecular dynamics study on fluorine radical multilayer ads..:
Numazawa, Satoshi
;
Machida, Ken
;
Isobe, Michiro
.
Japanese Journal of Applied Physics. 55 (2016) 11 - p. 116204 , 2016
Link:
https://doi.org/10.7567/jjap.55.116204
RT Journal T1
Molecular dynamics study on fluorine radical multilayer adsorption mechanism during Si, SiO2, and Si3N4 etching processes
UL https://suche.suub.uni-bremen.de/peid=cr-10.7567_jjap.55.116204&Exemplar=1&LAN=DE A1 Numazawa, Satoshi A1 Machida, Ken A1 Isobe, Michiro A1 Hamaguchi, Satoshi PB IOP Publishing YR 2016 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 55 IS 11 SP 116204 LK http://dx.doi.org/https://doi.org/10.7567/jjap.55.116204 DO https://doi.org/10.7567/jjap.55.116204 SF ELIB - SuUB Bremen
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