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1 Ergebnisse
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Impact of oxide thickness on the density distribution of ne..:
Zhang, Xufang
;
Okamoto, Dai
;
Hatakeyama, Tetsuo
...
Japanese Journal of Applied Physics. 57 (2018) 6S3 - p. 06KA04 , 2018
Link:
https://doi.org/10.7567/jjap.57.06ka04
RT Journal T1
Impact of oxide thickness on the density distribution of near-interface traps in 4H-SiC MOS capacitors
UL https://suche.suub.uni-bremen.de/peid=cr-10.7567_jjap.57.06ka04&Exemplar=1&LAN=DE A1 Zhang, Xufang A1 Okamoto, Dai A1 Hatakeyama, Tetsuo A1 Sometani, Mitsuru A1 Harada, Shinsuke A1 Iwamuro, Noriyuki A1 Yano, Hiroshi PB IOP Publishing YR 2018 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 57 IS 6S3 SP 06KA04 LK http://dx.doi.org/https://doi.org/10.7567/jjap.57.06ka04 DO https://doi.org/10.7567/jjap.57.06ka04 SF ELIB - SuUB Bremen
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