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1 Ergebnisse
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Effects of a capping oxide layer on polycrystalline-silicon..:
Li, Yi-Shao
;
Wu, Chun-Yi
;
Chou, Chia-Hsin
...
Japanese Journal of Applied Physics. 57 (2018) 6S3 - p. 06KB06 , 2018
Link:
https://doi.org/10.7567/jjap.57.06kb06
RT Journal T1 <Title>Effects of a capping oxide layer on polycrystalline-silicon thin-film transistors fabricated by continuous-wave laser crystallization</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.7567_jjap.57.06kb06&Exemplar=1&LAN=DE A1 Li, Yi-Shao A1 Wu, Chun-Yi A1 Chou, Chia-Hsin A1 Liao, Chan-Yu A1 Chuang, Kai-Chi A1 Luo, Jun-Dao A1 Li, Wei-Shuo A1 Cheng, Huang-Chung PB IOP Publishing YR 2018 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 57 IS 6S3 SP 06KB06 LK http://dx.doi.org/https://doi.org/10.7567/jjap.57.06kb06 DO https://doi.org/10.7567/jjap.57.06kb06 SF ELIB - SuUB Bremen
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