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1 Ergebnisse
1
Line-profile and critical dimension measurements using a no..:
, In:
13th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference. Advancing the Science and Technology of Semiconductor Manufacturing. ASMC 2002 (Cat. No.02CH37259)
,
Yang, Weidong
;
Lowe-Webb, R.
;
Korlahalli, R.
... - p. 119,120,121,122,123,124 , 2002
Link:
https://doi.org/10.1109/ASMC.2002.1001586
RT T1
13th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference. Advancing the Science and Technology of Semiconductor Manufacturing. ASMC 2002 (Cat. No.02CH37259)
: T1
Line-profile and critical dimension measurements using a normal incidence optical metrology system
UL https://suche.suub.uni-bremen.de/peid=ieee-1001586&Exemplar=1&LAN=DE A1 Yang, Weidong A1 Lowe-Webb, R. A1 Korlahalli, R. A1 Zhuang, V. A1 Sasano, H. A1 Liu, Wei A1 Mui, D. YR 2002 K1 Metrology K1 Optical scattering K1 Optical films K1 Monitoring K1 Spectroscopy K1 Optical diffraction K1 Diffraction gratings K1 Data mining K1 Etching K1 Lithography SP 119,120,121,122,123,124 LK http://dx.doi.org/https://doi.org/10.1109/ASMC.2002.1001586 DO https://doi.org/10.1109/ASMC.2002.1001586 SF ELIB - SuUB Bremen
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