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Formation and characteristics of the Si-O-C-H composite fil..:
, In:
PPPS-2001 Pulsed Power Plasma Science 2001. 28th IEEE International Conference on Plasma Science and 13th IEEE International Pulsed Power Conference. Digest of Papers (Cat. No.01CH37251)
,
Kyoung Suk Oh
;
Chi Kyu Choi
;
Heon-Ju Lee
.. - p. 1063,1064,1065 , 2001
Link:
https://doi.org/10.1109/PPPS.2001.1001727
RT T1
PPPS-2001 Pulsed Power Plasma Science 2001. 28th IEEE International Conference on Plasma Science and 13th IEEE International Pulsed Power Conference. Digest of Papers (Cat. No.01CH37251)
: T1
Formation and characteristics of the Si-O-C-H composite films with low dielectric constant deposited by O/sub 2//BTMSM-ICPCVD
UL https://suche.suub.uni-bremen.de/peid=ieee-1001727&Exemplar=1&LAN=DE A1 Kyoung Suk Oh A1 Chi Kyu Choi A1 Heon-Ju Lee A1 Shou-Yong Jing A1 Hong Young Chang YR 2001 K1 Dielectric constant K1 Optical films K1 Spectroscopy K1 Inorganic materials K1 Organic materials K1 Bonding K1 Crosstalk K1 Dielectric materials K1 Physics K1 Power engineering and energy SP 1063,1064,1065 LK http://dx.doi.org/https://doi.org/10.1109/PPPS.2001.1001727 DO https://doi.org/10.1109/PPPS.2001.1001727 SF ELIB - SuUB Bremen
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