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1 Ergebnisse
1
Advanced Color Filter Isolation Technology for Sub-Micron P..:
, In:
2022 International Electron Devices Meeting (IEDM)
,
Bak, Hojin
;
Lee, Horyeong
;
Kim, Won-Jin
... - p. 37.6.1-37.6.4 , 2022
Link:
https://doi.org/10.1109/IEDM45625.2022.10019484
RT T1 <cTitle>2022 International Electron Devices Meeting (IEDM)</cTitle>: T1 <Title>Advanced Color Filter Isolation Technology for Sub-Micron Pixel of CMOS Image Sensor</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10019484&Exemplar=1&LAN=DE A1 Bak, Hojin A1 Lee, Horyeong A1 Kim, Won-Jin A1 Choi, Inho A1 Kim, Hanjun A1 Kim, Dongha A1 Lee, Hanseung A1 Han, Sukman A1 Lee, Kyoung-In A1 Do, Youngwoong A1 Cho, Minsu A1 Baek, Moung-Seok A1 Kim, Kyungdo A1 Park, Wonje A1 Kang, Seong-Hun A1 Hong, Sung-Joo A1 Oh, Hoon-Sang A1 Song, Changrock YR 2022 SN 2156-017X K1 Optical filters K1 Surface waves K1 Metals K1 Optical crosstalk K1 Optical variables control K1 Optical imaging K1 Silicon SP 37.6.1 OP 37.6.4 LK http://dx.doi.org/https://doi.org/10.1109/IEDM45625.2022.10019484 DO https://doi.org/10.1109/IEDM45625.2022.10019484 SF ELIB - SuUB Bremen
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