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1 Ergebnisse
1
Low temperature source/drain epitaxy and functional silicid..:
, In:
2022 International Electron Devices Meeting (IEDM)
,
Porret, C.
;
Everaert, J.-L.
;
Schaekers, M.
... - p. 34.1.1-34.1.4 , 2022
Link:
https://doi.org/10.1109/IEDM45625.2022.10019501
RT T1 <cTitle>2022 International Electron Devices Meeting (IEDM)</cTitle>: T1 <Title>Low temperature source/drain epitaxy and functional silicides: essentials for ultimate contact scaling</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10019501&Exemplar=1&LAN=DE A1 Porret, C. A1 Everaert, J.-L. A1 Schaekers, M. A1 Ragnarsson, L.-A. A1 Hikavyy, A. A1 Rosseel, E. A1 Rengo, G. A1 Loo, R. A1 Khazaka, R. A1 Givens, M. A1 Piao, X. A1 Mertens, S. A1 Heylen, N. A1 Mertens, H. A1 De Carvalho Cavalcante, C. Toledo A1 Sterckx, G. A1 Brus, S. A1 Mehta, A. Nalin A1 Korytov, M. A1 Batuk, D. A1 Favia, P. A1 Langer, R. A1 Pourtois, G. A1 Swerts, J. A1 Litta, E. Dentoni A1 Horiguchi, N. YR 2022 SN 2156-017X K1 Fabrication K1 Temperature sensors K1 Annealing K1 Temperature K1 Metals K1 Doping K1 Conductivity SP 34.1.1 OP 34.1.4 LK http://dx.doi.org/https://doi.org/10.1109/IEDM45625.2022.10019501 DO https://doi.org/10.1109/IEDM45625.2022.10019501 SF ELIB - SuUB Bremen
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