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1 Ergebnisse
1
Systematic Search for Stabilizing Dopants in ZrO2 and HfO2 ..:
, In:
2022 International Symposium on Semiconductor Manufacturing (ISSM)
,
Harashima, Yosuke
;
Koga, Hiroaki
;
Ni, Zeyuan
... - p. 1-3 , 2022
Link:
https://doi.org/10.1109/ISSM55802.2022.10027044
RT T1 <cTitle>2022 International Symposium on Semiconductor Manufacturing (ISSM)</cTitle>: T1 <Title>Systematic Search for Stabilizing Dopants in ZrO2 and HfO2 Using First-Principles Calculations</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10027044&Exemplar=1&LAN=DE A1 Harashima, Yosuke A1 Koga, Hiroaki A1 Ni, Zeyuan A1 Yonehara, Takehiro A1 Katouda, Michio A1 Notake, Akira A1 Matsui, Hidefumi A1 Moriya, Tsuyoshi A1 Si, Mrinal Kanti A1 Hasunuma, Ryu A1 Uedono, Akira A1 Shigeta, Yasuteru YR 2022 K1 Temperature dependence K1 Systematics K1 Impurities K1 Lattices K1 Semiconductor device manufacture K1 Germanium K1 Silicon K1 first-principles calculations K1 high-throughput computing K1 high-k SP 1 OP 3 LK http://dx.doi.org/https://doi.org/10.1109/ISSM55802.2022.10027044 DO https://doi.org/10.1109/ISSM55802.2022.10027044 SF ELIB - SuUB Bremen
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