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1 Ergebnisse
1
Nanoimprint Lithography with CO2 Ambient:
, In:
2022 International Symposium on Semiconductor Manufacturing (ISSM)
,
Ito, Toshiki
;
Ito, Yuto
;
Kawata, Isao
... - p. 1-5 , 2022
Link:
https://doi.org/10.1109/ISSM55802.2022.10027095
RT T1
2022 International Symposium on Semiconductor Manufacturing (ISSM)
: T1
Nanoimprint Lithography with CO2 Ambient
UL https://suche.suub.uni-bremen.de/peid=ieee-10027095&Exemplar=1&LAN=DE A1 Ito, Toshiki A1 Ito, Yuto A1 Kawata, Isao A1 Ueyama, Ken-ichi A1 Nagane, Kouhei A1 Liu, Weijun A1 Stachowiak, Timothy A1 Zhang, Wei A1 Estrada, Teresa YR 2022 K1 Liquids K1 Carbon dioxide K1 Resists K1 Semiconductor device manufacture K1 Throughput K1 Solids K1 Nanolithography K1 Nanoimprint K1 Lithography K1 Photoresist K1 Helium SP 1 OP 5 LK http://dx.doi.org/https://doi.org/10.1109/ISSM55802.2022.10027095 DO https://doi.org/10.1109/ISSM55802.2022.10027095 SF ELIB - SuUB Bremen
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