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1 Ergebnisse
1
Plasma Diagnostics and Characteristics of Hydrofluorocarbon..:
, In:
2022 International Symposium on Semiconductor Manufacturing (ISSM)
,
Hsiao, Shih-Nan
;
Imai, Yusuke
;
Britrun, Nikolay
... - p. 1-3 , 2022
Link:
https://doi.org/10.1109/ISSM55802.2022.10027112
RT T1 <cTitle>2022 International Symposium on Semiconductor Manufacturing (ISSM)</cTitle>: T1 <Title>Plasma Diagnostics and Characteristics of Hydrofluorocarbon Films in Capacitively Coupled CF4/H2 Plasmas</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10027112&Exemplar=1&LAN=DE A1 Hsiao, Shih-Nan A1 Imai, Yusuke A1 Britrun, Nikolay A1 Tsutsumi, Takayoshi A1 Ishikawa, Kenji A1 Sekine, Makoto A1 Hori, Masaru YR 2022 K1 Spectroscopy K1 Plasma diagnostics K1 Absorption K1 Films K1 Hafnium K1 Semiconductor device manufacture K1 Probes K1 Capacitively-coupled plasma K1 Hydrofluorocarbon K1 Hydrogen K1 CF4 SP 1 OP 3 LK http://dx.doi.org/https://doi.org/10.1109/ISSM55802.2022.10027112 DO https://doi.org/10.1109/ISSM55802.2022.10027112 SF ELIB - SuUB Bremen
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