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1 Ergebnisse
1
Influence of patterned graphene mask on nucleation behavior..:
, In:
2022 19th China International Forum on Solid State Lighting & 2022 8th International Forum on Wide Bandgap Semiconductors (SSLCHINA: IFWS)
,
Li, Jianjie
;
Xu, Yu
;
Tao, Jiahao
... - p. 155-158 , 2023
Link:
https://doi.org/10.1109/SSLChinaIFWS57942.2023.1007111
RT T1 <cTitle>2022 19th China International Forum on Solid State Lighting & 2022 8th International Forum on Wide Bandgap Semiconductors (SSLCHINA: IFWS)</cTitle>: T1 <Title>Influence of patterned graphene mask on nucleation behavior of GaN by MOCVD</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10071116&Exemplar=1&LAN=DE A1 Li, Jianjie A1 Xu, Yu A1 Tao, Jiahao A1 Cai, Xin A1 Wang, Yuning A1 Wang, Guobin A1 Cao, Bing A1 Xu, Ke YR 2023 K1 Strips K1 Photonic band gap K1 Graphene K1 Market research K1 Behavioral sciences K1 Epitaxial growth K1 Dielectrics SP 155 OP 158 LK http://dx.doi.org/https://doi.org/10.1109/SSLChinaIFWS57942.2023.10071116 DO https://doi.org/10.1109/SSLChinaIFWS57942.2023.10071116 SF ELIB - SuUB Bremen
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