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1 Ergebnisse
1
Prediction and Optimization of Electric Resistance of Print..:
, In:
2022 IEEE MTT-S International Microwave Workshop Series on Advanced Materials and Processes for RF and THz Applications (IMWS-AMP)
,
Chen, Hao
;
Huang, Tian-Yu
;
Zhang, Yi-Yang
... - p. 1-3 , 2022
Link:
https://doi.org/10.1109/IMWS-AMP54652.2022.10107080
RT T1 <cTitle>2022 IEEE MTT-S International Microwave Workshop Series on Advanced Materials and Processes for RF and THz Applications (IMWS-AMP)</cTitle>: T1 <Title>Prediction and Optimization of Electric Resistance of Printed Graphene Nanosheet Based on Artificial Intelligence</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10107080&Exemplar=1&LAN=DE A1 Chen, Hao A1 Huang, Tian-Yu A1 Zhang, Yi-Yang A1 Liu, En-Cheng A1 Yang, Wu A1 Lu, Wei-Bing YR 2022 SN 2694-2992 K1 Resistance K1 Support vector machines K1 Radio frequency K1 Graphene K1 Artificial neural networks K1 Predictive models K1 Prediction algorithms K1 Graphene resistance K1 machine learning K1 artificial neural network SP 1 OP 3 LK http://dx.doi.org/https://doi.org/10.1109/IMWS-AMP54652.2022.10107080 DO https://doi.org/10.1109/IMWS-AMP54652.2022.10107080 SF ELIB - SuUB Bremen
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