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1 Ergebnisse
1
Polarity Dependency and 1/E Model of Gate Oxide TDDB Degrad..:
, In:
2023 IEEE International Reliability Physics Symposium (IRPS)
,
Qu, Lina
;
Yang, Shengwei
;
He, Ming
... - p. 1-4 , 2023
Link:
https://doi.org/10.1109/IRPS48203.2023.10117688
RT T1
2023 IEEE International Reliability Physics Symposium (IRPS)
: T1
Polarity Dependency and 1/E Model of Gate Oxide TDDB Degradation in 3D NAND
UL https://suche.suub.uni-bremen.de/peid=ieee-10117688&Exemplar=1&LAN=DE A1 Qu, Lina A1 Yang, Shengwei A1 He, Ming A1 Fang, Rui A1 Zhu, Xiaojuan A1 Han, Kun A1 He, Yi YR 2023 SN 1938-1891 K1 Semiconductor device modeling K1 Degradation K1 Solid modeling K1 Three-dimensional displays K1 Hydrogen K1 Fitting K1 Metals K1 TDDB K1 1/E model K1 polarity K1 hydrogen K1 back-end-of-line process SP 1 OP 4 LK http://dx.doi.org/https://doi.org/10.1109/IRPS48203.2023.10117688 DO https://doi.org/10.1109/IRPS48203.2023.10117688 SF ELIB - SuUB Bremen
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